OCD_Hub
Simple, web based and pluggable Optical Stack and CD measurement Solution
OCD_Hub
The OCD Hub is a high-performance, GPU-accelerated computational metrology platform engineered to balance rigorous physical electrodynamics with high-speed execution. This platform acts as a universal software-driven suite designed to model both planar thin-film stacks and complex, three-dimensional periodic gratings natively on graphic processing units. By integrating dual physical optimization engines with deep neural networks, the system enables semiconductor fabrication facilities to resolve nanoscale parameters with exceptional speed and accuracy. The platform serves as a complete wafer-level diagnostic system that translates raw spectroscopic reflections into actionable statistical process control charts and radial uniformity maps. Ultimately, this software-driven platform empowers engineers to maximize the performance of their existing fab tools, avoiding the need for expensive hardware upgrades while significantly reducing calibration bottlenecks
Ellipsometry
Ellipsometry is a non-destructive optical metrology technique used to characterize planar thin-film layers without physical contact. The process works by shining an oblique, polarized, broadband beam of light onto uniform test pads and capturing how the light's polarization state changes upon reflection. These physical reflections are decoded into phase and amplitude spectroscopic waveforms that represent a unique optical fingerprint of the underlying material. By fitting these waveforms through electromagnetic wave equations, the platform resolves individual film thicknesses down to sub-nanometer limits. Furthermore, this method simultaneously extracts refractive index values using dispersion formulas to identify subtle chemical variations, layer densities, and deposition stoichiometry drifts
Scatterometry
Scatterometry is an advanced optical metrology approach used to measure the complex, three-dimensional cross-sectional profiles of sub-micron periodic structures. When oblique broadband light hits these patterned gratings, the light undergoes high-order diffraction and multidirectional interference that corresponds to the structure's physical shape. To resolve these complex patterns, the software platform slices the periodic gratings into multiple horizontal sub-slices to simulate light propagation using rigorous electromagnetic solvers. This allows the system to non-destructively extract key dimensions such as the top critical dimension, middle critical dimension, bottom critical dimension, and sidewall angles of the transistors. By measuring these buried parameters in real time, scatterometry provides critical feedback on etch depths and reactive ion etching performance to ensure total process control
Reverse enginnering
Reverse stack definition, also called blind stack discovery, is an automated optimization process used to characterize unknown wafer samples with unverified layer sequences. The platform's specialized engine automatically generates multiple structural hypotheses, testing a variety of single-layer and multi-layer material sequence combinations. Each proposed configuration is mathematically simulated and fitted against the experimental spectroscopic data to evaluate its physical accuracy. The hypotheses are then ranked on an interactive leaderboard according to their mean squared error and statistical metrics like the Akaike Information Criterion to prevent mathematical overfitting. Once the optimal material structure is identified, the system allows the engineer to instantly import the discovered stack sequence directly into their active recipes
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Same Hardware
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Same System
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Allow us to unlock the full potential of your existing tools – using the same system, same hardware , and new software - for brand new capabilities.
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